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第20届国际分子束外延(MBE)会议落户上海

发布于2017-10-04 11:09    文章来源:未知

IC-MBE 2016 is over. Thank you for coming! See you in Shanghai in 2018!
 
After the successful conferences in Berlin, Germany (2010), Nara, Japan (2012) and Flagstaff, USA (2014), the 19th International Conference on Molecular-Beam Epitaxy will take place in Montpelier, France.

The International Conference on Molecular Beam Epitaxy (MBE 2016) provides a prominent international forum for reporting new developments in the areas of fundamental and applied molecular beam epitaxy research, including advances in the technique, synthesis of new materials, discovery of new physical properties, formation of novel heterostructures, and the development of innovative devices.


The 20th International Conference on Molecular Beam Epitaxy (MBE 2018) will be held in September 2018 (Not Final). The 20th International Conference on Molecular Beam Epitaxy (MBE 2018) is a conference that covers topics such as:

Molecular Beam Epitaxy growth modifications
Fundamentals of Molecular Beam Epitaxy growth
Molecular Beam Epitaxy technology (e.g. in situ monitoring)
Materials characterization
III-Nitrides and dilute-nitrides
Molecular Beam Epitaxy as a production technology
II-VI materials
Oxides
III-V materials and structures
ZnO
SiGeSnC alloys, SiC, and graphene
Heteroepitaxy
Low dimensional nanostructures
Hybrid materials
Photonic devices
Solar cells
Thermoelectrics
Electronic devices
Device physics
Spintronics

See you again in Shanghai in 2018!