20th International Conference on Molecular Beam Epitaxy
September 2-7, 2018, Shanghai, China
After the successful conferences in Nara, Japan (2012), Flagstaff, USA (2014) and Montpellier, France (2016), the 20th International Conference on Molecular Beam Epitaxy will take place in Shanghai, China.
The International Conference on Molecular Beam Epitaxy (ICMBE 2018) provides a prominent international forum for reporting new developments in the areas of fundamental and applied molecular beam epitaxy research, including advances in the technique, synthesis of new materials, discovery of new physical properties, formation of novel heterostructures, and the development of innovative devices.
Organizing Committee Chairs
Conference Chair: Ai-Zhen Li
Shanghai Institute of Microsystem and Information Technology, CAS, China
Program Chair: Li He
Shanghai Institute of Technical Physics, CAS, China
Website Link: http://mbe2018.csp.escience.cn